Torch load

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We examine the effect of an atmospheric-pressure Ar/CO2 microwave torch on nanocarbon films formed on the surface of silicon wafers by vertical deposition from an ethyl colloidal solution of carbon nanoparticles. The spatial distribution of the microwave torch plasma temperature is obtained for the optimal plasma treatment regime, which does not lead to significant morphological changes in the surface. It is shown that the nanocarbon coating exhibits high resistance to plasma loading.

Treatment indications for patients with chronic hepatitis B (CHB) remain contentious, particularly for patients with mild alanine aminotransferase (ALT) elevation. We aimed to evaluate treatment effects in this patient population.